ASML, a leading supplier in the global semiconductor equipment industry, has developed its latest High Numerical Aperture (High NA) extreme ultraviolet (EUV) lithography machine, priced at over $400 million. The machine, larger than a double-decker bus and weighing as much as two Airbus A320 aircraft, required a team of 250 engineers and six months to install the first unit. Assembled in the Netherlands, the High NA system consists of four modules, with five units already shipped. ASML emphasizes that this advanced equipment is essential for chipmakers aiming to participate in the artificial intelligence (AI) boom, as producing semiconductor volumes below 7 nanometers at scale is increasingly challenging without their technology. The company is also actively researching new methods to create even smaller nanostructures, targeting atomic-scale precision expected to be achievable only in the next century.